Method for thermal development with supporting surface for a development medium
US8468941B2 · kind B2 · utility
5Cited by
6References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2009 |
| Grant date | Jun 25, 2013 |
| Priority date | — |
| Expiry date | Jan 11, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.