Method for the production of an ultra barrier layer system

US8470140B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Christoph Charton · Dresden, DE
• Matthias Fahland · Dresden, DE
• Mario Krug · Neustadt in Sachsen, DE
• Nicolas Schiller · Helmsdorf, DE
• Steffen Straach · Dresden, DE

Key dates

• Filing date: Nov 23, 2004
• Grant date: Jun 25, 2013
• Expiry date: Mar 12, 2031

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B05D1/62
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.