Patent · US Active

Method of fabricating electrode structures on substrate

US8470150B2 · kind B2 · utility

2Cited by
17References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 12, 2011
Grant dateJun 25, 2013
Priority date
Expiry dateJan 20, 2032

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D15/00
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Methods for fabricating electrode structures on a substrate are presented. The fabrication method includes providing a substrate with a patterned metal layer thereon, defining an electrode area. A passivation glue is formed on the patterned metal layer. An electrode layer is formed in the electrode area. A filling process is performed to deposit nano metal oxides on the electrode layer to extensively fill the entire electrode area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.