Position measuring arrangement

US8477317B2 · kind B2 · utility

Assignee

• DR. JOHANNES HEIDENHAIN GMBH · DE

Inventors

• Florian Schindler · Traunstein, DE
• Robert Thomas Kraus · Akron, US
• Joel Heersink · Traunstein, DE
• Michael Stepputat · Traunstein, DE

Key dates

• Filing date: Jul 28, 2010
• Grant date: Jul 2, 2013
• Expiry date: Sep 19, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G01S17/36
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A position measuring arrangement that includes a retroreflector, a light source generating a lightbeam and a scanning unit that generates a partially-divergent lightbeam. The scanning unit includes a scanning mirror mounted so it is deflected in a reproducible manner so that a grid-like scanning of a two-dimensional spatial area by the partially-divergent lightbeam takes place over a plurality of scanning tracks. The position measuring arrangement including an interferometric distance measuring unit that includes a beam splitter element that splits the lightbeam generated by the light source so that split lightbeams pass through a reference arm and a measuring arm at least once in each direction. The interferometric distance measuring unit includes an opto-electronic detector unit, through which a detection of distance-dependent signals from superimposed lightbeams from the reference arm and the measuring arm takes place.