Distributed feedback laser having enhanced etch stop features
US8477817B1 · kind B1 · utility
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2References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 11, 2010 |
| Grant date | Jul 2, 2013 |
| Priority date | — |
| Expiry date | Oct 12, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/34306
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In one example embodiment, a DFB laser includes a substrate, an active region positioned above the substrate, and a grating layer positioned above the active region. The grating layer includes a portion that serves as a primary etch stop layer. The DFB laser also includes a secondary etch stop layer located either above or below the grating layer, and a spacer layer interposed between the grating layer and the active region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.