Patent · US Active

System and method for beam focusing and control in an indirectly heated cathode

US8477908B2 · kind B2 · utility

3Cited by
6References
22Claims
0Family size

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Key dates

Filing dateNov 13, 2009
Grant dateJul 2, 2013
Priority date
Expiry dateNov 13, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2235/167
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

An indirectly heated cathode assembly is presented. The indirectly heated cathode assembly includes at least one electron source for generating a first electron beam, an emitter for producing a second electron beam when heated by the first electron beam and a focusing electrode for controlling, and directing the first electron beam towards the emitter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.