System and method for beam focusing and control in an indirectly heated cathode
US8477908B2 · kind B2 · utility
3Cited by
6References
22Claims
0Family size
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Key dates
| Filing date | Nov 13, 2009 |
| Grant date | Jul 2, 2013 |
| Priority date | — |
| Expiry date | Nov 13, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/167
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An indirectly heated cathode assembly is presented. The indirectly heated cathode assembly includes at least one electron source for generating a first electron beam, an emitter for producing a second electron beam when heated by the first electron beam and a focusing electrode for controlling, and directing the first electron beam towards the emitter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.