Apparatus and method for imparting wide angle low reflection on conductive surfaces
US8481153B1 · kind B1 · utility
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Key dates
| Filing date | Feb 23, 2011 |
| Grant date | Jul 9, 2013 |
| Priority date | — |
| Expiry date | Oct 6, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method for imparting wide angle low reflection on any high reflective surfaces through resonant excitation of plasmonic leaky mode of a nanocavity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.