Test substrate and method for measuring contact force
US8482183B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 9, 2010 |
| Grant date | Jul 9, 2013 |
| Priority date | — |
| Expiry date | Mar 10, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L5/0085
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A test substrate for measuring contact force and a method for measuring contact force are provided in the technology. The substrate may comprises: a base substrate, and a piezoelectric element provided on a surface of the base substrate. One end of the piezoelectric portion is a detecting voltage input terminal and the other end thereof is a detecting voltage output terminal. According to the technology, the substrate and method for measuring contact force can be used to measure the contact force applied to the substrate by the cleaning apparatus or conveying apparatus, and thus the contact force can be properly controlled and the adverse influence on the substrate from the conveying apparatus or cleaning apparatus can be decreased or eliminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.