Patent · US Active

Methods for fabrication of positional and compositionally controlled nanostructures on substrate

US8486287B2 · kind B2 · utility

14Cited by
27References
31Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 14, 2004
Grant dateJul 16, 2013
Priority date
Expiry dateMay 22, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D30/62
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Fabrication methods disclosed herein provide for a nanoscale structure or a pattern comprising a plurality of nanostructures of specific predetermined position, shape and composition, including nanostructure arrays having large area at high throughput necessary for industrial production. The resultant nanostracture patterns are useful for nanostructure arrays, specifically sensor and catalytic arrays.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.