Methods for fabrication of positional and compositionally controlled nanostructures on substrate
US8486287B2 · kind B2 · utility
14Cited by
27References
31Claims
0Family size
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Key dates
| Filing date | Oct 14, 2004 |
| Grant date | Jul 16, 2013 |
| Priority date | — |
| Expiry date | May 22, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/62
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Fabrication methods disclosed herein provide for a nanoscale structure or a pattern comprising a plurality of nanostructures of specific predetermined position, shape and composition, including nanostructure arrays having large area at high throughput necessary for industrial production. The resultant nanostracture patterns are useful for nanostructure arrays, specifically sensor and catalytic arrays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.