Patent · US Active

Roll-to-roll digital photolithography

US8486593B2 · kind B2 · utility

2Cited by
2References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 17, 2009
Grant dateJul 16, 2013
Priority date
Expiry dateMay 24, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/166
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

Methods of making flexible circuit films include providing a polymer film or other flexible substrate having a plurality of alignment marks and a photosensitive material thereon. The substrate passes around a suitable roller, belt, or other inelastic conveyor such that the substrate and the conveyor move together at least from a first location to a second location. Positions of a first set of the alignment marks on a first portion of the substrate are measured when such portion is at the first location, and the measured positions can be used to calculate a distortion of the substrate. The photosensitive material is then patternwise exposed when the first portion of the substrate has moved to the second location. The patternwise exposing is based on the measured positions of the first set of alignment marks, and may include exposing the web with a distortion-adjusted pattern. Related systems and articles are also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.