Method of manufacturing nano-structure and method of manufacturing a pattern using the method
US8486613B2 · kind B2 · utility
4Cited by
2References
23Claims
0Family size
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Key dates
| Filing date | Dec 11, 2009 |
| Grant date | Jul 16, 2013 |
| Priority date | — |
| Expiry date | Dec 26, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0149
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
According to an example embodiment of the present invention, a photoresist pattern is formed on a base substrate including a neutral layer. A sacrifice structure including a first sacrifice block and a second sacrifice block is formed on the base substrate having the photoresist pattern, and the sacrifice structure is formed from a first thin film including a first block copolymer. Thus, a chemical pattern is formed to form a nano-structure. Therefore, the nano-structure may be easily formed on a substrate having a large size by using a block copolymer, and productivity and manufacturing reliability may be improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.