Method for manufacturing array substrate of transflective liquid crystal display
US8486740B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 11, 2012 |
| Grant date | Jul 16, 2013 |
| Priority date | — |
| Expiry date | Mar 11, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136236
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing an array substrate of a transflective LCD includes: (1) providing a substrate; (2) forming a transparent electrode layer on the substrate and forming a first metal layer on the transparent electrode layer; (3) applying a first photo-masking operation to form a gate terminal, a pixel electrode, and a reflector section; (4) forming an insulation layer on the gate terminal, the pixel electrode, and the reflector section; (5) applying a second photo-masking operation to form a gate insulation layer on the insulation layer; (6) forming a semiconductor layer on the gate insulation layer and forming a second metal layer on the semiconductor layer; and (7) applying a third photo-masking operation to form a channel layer on the semiconductor layer and also forming a drain terminal and a source terminal on the second metal layer, so as to form a thin-film transistor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.