Ultra-high vacuum photoelectron linear accelerator
US8487556B2 · kind B2 · utility
2Cited by
6References
13Claims
0Family size
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Key dates
| Filing date | Mar 8, 2011 |
| Grant date | Jul 16, 2013 |
| Priority date | — |
| Expiry date | Oct 19, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2007/122
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An rf linear accelerator for producing an electron beam. The outer wall of the rf cavity of said linear accelerator being perforated to allow gas inside said rf cavity to flow to a pressure chamber surrounding said rf cavity and having means of ultra high vacuum pumping of the cathode of said rf linear accelerator. Said rf linear accelerator is used to accelerate polarized or unpolarized electrons produced by a photocathode, or to accelerate thermally heated electrons produced by a thermionic cathode, or to accelerate rf heated field emission electrons produced by a field emission cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.