Patent · US Active

Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same

US8488103B2 · kind B2 · utility

1Cited by

9References

9Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Alexandra Pazidis · Aalen, DE
Christoph Zaczek · Heubach, DE
Horst Feldermann · Aalen, DE
Peter Huber · Neubiberg, DE

Key dates

Filing date	May 14, 2010
Grant date	Jul 16, 2013
Priority date	—
Expiry date	Mar 31, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70958
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical element (1a, 1b) for reflecting UV radiation at an operating wavelength below 250 nm, preferably at 193 nm, which has a substrate (2a, 2b), a reflective layer (3a, 3b) made of aluminum superimposed on the substrate (2a, 2b). The reflective aluminum layer (3a, 3b) is not transparent to UV radiation and is (111)-plane oriented. The reflective optical element (1a, 1b) has a reflectivity of more than 85%, preferably of more than 88%, and even more preferably of more than 92%, in a range of incident angles of at least 10°, preferably of at least 15°, at the operating wavelength. Also disclosed is an optical element having a reflective layer made from a material having a melting point higher than that of aluminum, as well as methods for producing such optical elements, and optical arrangements incorporating such optical elements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.