Patent · US Active

Enhanced depth of field based on uniform relative illumination via lens with large distortion

US8488258B2 · kind B2 · utility

12Cited by

0References

20Claims

0Family size

Assignee

Digitaloptics Corporation Europe Limited · IE

Inventors

Gal Shabtay · Tel Aviv-Yafo, IL
Ephraim Goldenberg · Ashdod, IL
Pavel Reshidko · Nes Ziona, IL
Noy Cohen · Nes Ziona, IL

Key dates

Filing date	Jun 7, 2011
Grant date	Jul 16, 2013
Priority date	—
Expiry date	Nov 22, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG02B13/0045
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lens system is provided that comprises an enhanced depth of field based on a uniform or near uniform relative illumination via a lens with a large distortion. The distortion can be corrected with image processing equipment. The lens system can comprise an aperture stop and a group of lens, wherein there can be about five lenses in the group of lenses. The lens system is designed for relative illumination such that the light distribution over the lens system is substantially uniform.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.