Diamond nucleation using polyethene
US8491964B1 · kind B1 · utility
5Cited by
1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 23, 2011 |
| Grant date | Jul 23, 2013 |
| Priority date | — |
| Expiry date | Jun 5, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/272
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention presents a simple, non-destructive and non-abrasive method of diamond nucleation using polyethene. It particularly describes the nucleation of diamond on an electrically viable substrate surface using polyethene via chemical vapor deposition (CVD) technique in a gaseous environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.