Ink composition and method of forming a pattern using the same
US8492459B2 · kind B2 · utility
0Cited by
3References
8Claims
0Family size
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Key dates
| Filing date | Dec 12, 2008 |
| Grant date | Jul 23, 2013 |
| Priority date | — |
| Expiry date | Oct 4, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
There are provided an ink composition for imprint lithography and roll-printing, which is applied to the formation of a pattern using imprint lithography and roll-printing to play the role of a pattern support, can increase the accuracy of pattern formation by minimizing the occurrence of a swelling phenomenon caused by the ink composition, and can improve yield and the efficiency of the process by increasing the transfer rate of a pattern, and a method of forming a pattern of a display or semiconductor by using the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.