Method for starting a gas-phase oxidation reactor
US8492566B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 7, 2009 |
| Grant date | Jul 23, 2013 |
| Priority date | — |
| Expiry date | Feb 16, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07D307/89
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
What is described is a process for starting up a gas phase oxidation reactor for oxidation of o-xylene to phthalic anhydride, said reactor comprising at least one catalyst layer and being temperature-controllable by means of a heat carrier medium, wherein a) the catalyst layer is interrupted by a moderator layer which is less catalytically active than the catalyst layer or is catalytically inactive, b) a gas stream is passed through the reactor with an initial loading of o-xylene and at an initial temperature of the heat transfer medium, c) the loading of the gas stream is increased to a target loading and, in parallel, the temperature of the heat transfer medium is lowered to an operating temperature. The introduction of the moderator layer allows the loading to be increased more rapidly and the startup time to be shortened.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.