Plasma generation apparatus
US8492979B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2010 |
| Grant date | Jul 23, 2013 |
| Priority date | — |
| Expiry date | Dec 3, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/44
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Provided is an apparatus, such as an arc mitigating device, which can include a first plasma generation device and a second plasma generation device. The second plasma generation device can include a pair of opposing and spaced apart electrodes and a low voltage, high current energy source connected therebetween. A conduit can be configured to direct plasma between the first and second plasma generation devices, such that the second plasma generation device receives plasma generated by the first plasma generation. The plasma from the first plasma generation device can act to reduce the impedance of an area between the pair of opposing electrodes sufficiently to allow an arc to be established therebetween due to the low voltage, high current energy source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.