Vacuum treatment installation and vacuum treatment method
US8496793B2 · kind B2 · utility
1Cited by
5References
48Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 28, 2008 |
| Grant date | Jul 30, 2013 |
| Priority date | — |
| Expiry date | Apr 26, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32055
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Vacuum treatment installation or vacuum treatment method for carrying out a plasma method, wherein the treatment is carried out in a vacuum chamber, in which are disposed a device for generating an electric low voltage arc discharge (NVBE) comprised of a cathode and an anode electrically interconnectable with the cathode via an arc generator, and a workpiece carrier electrically interconnectable with a bias generator for receiving and moving workpieces, as well as at least one feed for inert and/or reactive gas. At least a portion of the surface of the anode is therein fabricated of graphite and is operated at high temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.