Radiation source apparatus and DUV beam generation method
US8503068B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 30, 2011 |
| Grant date | Aug 6, 2013 |
| Priority date | — |
| Expiry date | Apr 10, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/354
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a radiation source apparatus which can generate a DUV radiation beam having a wavelength of 193.4 nm efficiently. The radiation source apparatus according to the invention has first wavelength conversion means arranged to receive a first laser beam of a first fundamental wavelength and to generate a fourth-harmonic wavelength of the first fundamental wavelength, second wavelength conversion means arranged to receive the beam of the fourth-harmonic wavelength of the first fundamental wavelength (266 nm) and a second laser beam of a second fundamental wavelength and to sum-frequency mix the fourth-harmonic with the second fundamental wavelength radiation to generate a beam of second DUV radiation having a wavelength between approximately 232 nm and 237 nm, and third wavelength conversion means arranged to receive the beam of second DUV radiation and the third laser beam of a third fundamental wavelength and to sum-frequency mix the second DUV radiation with the third fundamental wavelength radiation to generate third DUV radiation having a wavelength between approximately 192.5 nm and 194.5 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.