Semiconductor hollow-core waveguide using photonic crystal gratings
US8506829B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 4, 2010 |
| Grant date | Aug 13, 2013 |
| Priority date | — |
| Expiry date | Oct 15, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12061
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor hollow-core waveguide using high-contrast gratings or photonic crystal claddings and a method of manufacturing the same includes providing a layered semiconductor structure; creating an etching mask pattern over the layered semiconductor structure; performing a combined cycled directional etching process on the layered semiconductor structure in one sequence and in one lithography level to create a 3-dimensional waveguide structure; and creating a hollow air core in the layered semiconductor structure by removing to define a shape of the waveguide. The etching process comprises vertically etching a series of deep trenches on the layered semiconductor structure with precise control and varying the width of the trench. Furthermore, the hollow air core is created by removing a portion of the sacrificial material located in the center of the waveguide and under the waveguide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.