Patent · US Active

Microstructure photomultiplier assembly

US8507838B2 · kind B2 · utility

0Cited by
23References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 5, 2010
Grant dateAug 13, 2013
Priority date
Expiry dateAug 16, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J43/22
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The Microstructure Photomultiplier Assembly (MPA) enables the effective conversion of light signals (received at the front of the assembly) into readily-detectable electrical signals. The MPA comprises a photocathode, followed by an electron-multiplying plate(s) made from an insulating substrate which does not emit sufficient contaminants to poison the photocathode. Each plate is coated with a conductive layer. The front face of each plate is further coated with a layer of secondary electron-emissive material which, when struck by an incoming electron, can produce secondary electrons. Each plate is perforated with channels. The channels are designed to promote the efficient transfer and acceleration of electrons through the channels, under an applied voltage differential across the plate(s). An anode (pixelated or non-pixelated) at the end of the last plate collects the electrons and generates an electrical signal. The MPA is contained within a vacuum enclosure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.