Method for fluid processing a workpiece
US8512543B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2010 |
| Grant date | Aug 20, 2013 |
| Priority date | — |
| Expiry date | Mar 28, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67126
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of fluid processing a semiconductor workpiece, including disposing a workpiece holder with a housing capable of containing a fluid, the workpiece holder retaining the workpiece, providing an agitation system connected to the housing and comprising a member disposed within the housing adjacent the workpiece holder, and agitating the fluid by moving the member substantially parallel to a surface of the workpiece with a non-uniform oscillatory motion, the non-uniform oscillatory motion being a series of substantially continuous geometrically asymmetric oscillations wherein each consecutive oscillation of the series is geometrically asymmetric having at least two substantially continuous opposing strokes wherein reversal positions of each substantially continuous stroke of the substantially continuous asymmetric oscillation are disposed asymmetrically with respect to a center point of each immediately preceding substantially continuous stroke of the oscillation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.