Functionalized perfluoropolyether material as a hydrophobic coating
US8512935B2 · kind B2 · utility
0Cited by
8References
21Claims
0Family size
Assignee
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Key dates
| Filing date | May 8, 2009 |
| Grant date | Aug 20, 2013 |
| Priority date | — |
| Expiry date | May 8, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In some embodiments, without limitation, a hydrophobic photoresist material and a method of making the photoresist material are provided. The photoresist material is derived by creating a high resolution insoluble, or more soluble, polymer structure as a result of a controlled chemical reaction with a functionalized perfluoropolyether. Also provided are methods of coating an inkjet printhead surface and processing the coated inkjet printhead surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.