Full numerical aperture pump of laser-sustained plasma
US8517585B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2011 |
| Grant date | Aug 27, 2013 |
| Priority date | — |
| Expiry date | Apr 24, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A laser-sustained light source having a first laser source for providing a first beam portion having a first characteristic, a second laser source for providing a second beam portion having a second characteristic, where the first characteristic is different from the first characteristic, first optics that are reflective to the first characteristic and transmissive of the second characteristic, for reflecting the first beam portion along a first path into a reflection optics and through a cell to sustain a plasma, second optics that are reflective to the second characteristic and transmissive of the first characteristic, for reflecting the second beam portion along a second path into the reflection optics and through the cell to sustain the plasma, the first path exiting to the second optics, where the first beam is transmitted through the second optics and into a beam dump, and the second path exiting to the first optics, where the second beam is transmitted through the first optics and into the beam dump.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.