Method of forming organic film
US8518487B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2011 |
| Grant date | Aug 27, 2013 |
| Priority date | — |
| Expiry date | Dec 27, 2031 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/34
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming an organic film is provided and includes followings. An apparatus is provided and includes a gas storage chamber, an evaporator, a pressure gauge, a pyrolysis chamber connected with the gas storage chamber, and a deposition chamber. The evaporator connects with the pyrolysis chamber through the gas storage. An organic material in the evaporator is evaporated to form organic gas, wherein the organic gas is passed into the gas storage chamber. When pressure of the organic gas in the gas storage chamber, measured by the pressure gauge, reaches a predetermined value, a valve between the evaporator and the gas storage chamber is turned off and another valve is turned on for passing the organic gas into the pyrolysis chamber. The organic gas is pyrolyzed in the pyrolysis chamber to form a monomer. The monomer is delivered to the deposition chamber for deposition to form an organic film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.