Optical recording material, optical recording method, photosensitive material and method
US8518631B2 · kind B2 · utility
0Cited by
3References
17Claims
0Family size
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Key dates
| Filing date | Jan 28, 2009 |
| Grant date | Aug 27, 2013 |
| Priority date | — |
| Expiry date | Jan 12, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2007/24624
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is a nonlinear optical material, an optical recording material, an optical recording method, a photosensitive material, a photopolymerization initiator, and a photosensitizer. One exemplary aspect of the present invention is a photosensitive material used for photolithography for forming a pattern by irradiating a photoresist with excitation light which includes a donor molecule 11 that is excited by the excitation light, and an acceptor molecule 12 that is excited by energy transfer or charge transfer from the excited donor 11.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.