Process and system for fabrication of patterns on a surface

US8524100B2 · kind B2 · utility

Assignee

• THE PROVOST, FELLOWS AND SCHOLARS OF THE COLLEGE OF THE HOLY AND UNDIVIDED TRINITY OF QUEEN ELIZABETH NEAR DUBLIN · IE

Inventors

• Graham Cross · Dublin, IE
• Warren McKenzie · York, AU
• John B. Pethica · Felton, GB

Key dates

• Filing date: Jul 3, 2009
• Grant date: Sep 3, 2013
• Expiry date: Jul 3, 2029

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/24802
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

The invention provides a system and process of patterning structures on a carbon based surface comprising exposing part of the surface to an ion flux, such that material properties of the exposed surface are modified to provide a hard mask effect on the surface. A further step of etching unexposed parts of the surface forms the structures on the surface. The inventors have discovered that by controlling the ion exposure, alteration of the surface structure at the top surface provides a mask pattern, without substantially removing any material from the exposed surface. The mask allows for subsequent ion etching of unexposed areas of the surface leaving the exposed areas raised relative to the unexposed areas thus manufacturing patterns onto the surface. For example, a Ga+ focussed ion beam exposes a pattern onto a diamond surface which produces such a pattern after its exposure to a plasma etch. The invention is particularly suitable for patterning of clear well-defined structures down to nano-scale dimensions.