Process for the production of microelectromechanical systems

US8524112B2 · kind B2 · utility

Assignee

• SOLVAY FLUOR GMBH · DE

Inventor

• Marcello Riva · Hannover, DE

Key dates

• Filing date: Dec 16, 2008
• Grant date: Sep 3, 2013
• Expiry date: Dec 14, 2029

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/31116
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Elemental fluorine and carbonyl fluoride are suitable etchants for producing microelectromechanical devices (“MEMS”). They are preferably applied as mixtures with nitrogen and argon. If applied in Bosch-type process, C4F6 is a highly suitable passivating gas.