Integrated membrane lamination and UV exposure system and method of the same
US8524442B1 · kind B1 · utility
Inventors
Key dates
| Filing date | Feb 13, 2012 |
| Grant date | Sep 3, 2013 |
| Priority date | — |
| Expiry date | Mar 18, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2032
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A combined laminating and exposing apparatus for exposing a photosensitive printing blank to actinic radiation in a printing plate manufacturing system and a method of using the same are disclosed. The photosensitive printing blank comprises a backing layer, at least one photocurable layer disposed on the backing layer, and a laser ablatable mask layer disposed on the at least one photocurable layer, wherein the laser ablatable mask layer is laser ablated to create an in situ negative in the laser ablatable mask layer. The exposing apparatus comprises: (a) a laminating apparatus for laminating an oxygen barrier layer to a top of the laser ablated mask layer; (b) a conveyor; (c) a first exposing device for imagewise exposing the at least one photocurable layer to actinic radiation, and (d) a second exposing device for exposing the at least one photocurable layer to actinic radiation through the backing layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.