Electrophoretic fabricated freestanding all-nanoparticle thin film materials
US8529745B2 · kind B2 · utility
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Key dates
| Filing date | Oct 5, 2009 |
| Grant date | Sep 10, 2013 |
| Priority date | — |
| Expiry date | Mar 25, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D13/20
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and apparatus for electrophoretic fabricating freestanding all nanoparticle thin films, and the resulting compositions of matter, are described. A method includes electrophoretically depositing a thin film of nanoparticles on a sacrificial layer; and freeing the thin film from the sacrificial layer. A composition of matter includes a free standing thin film of nanoparticles with no functionalized nanoparticles or chemical cross linkers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.