Patent · US Active

Process for improving the emission of electron field emitters

US8529798B2 · kind B2 · utility

2Cited by

34References

7Claims

0Family size

Assignee

E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

Robert Joseph Bouchard · Wilmington, US
Lap-Tap Andrew Cheng · Newark, US
David Herbert Roach · Hockessin, US
John Gerard Lavin · Swarthmore, US

Key dates

Filing date	Oct 27, 2008
Grant date	Sep 10, 2013
Priority date	—
Expiry date	Dec 8, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2329/00
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

This invention provides a process for improving the field emission of an electron field emitter comprised of an acicular emitting substance such as acicular carbon, an acicular semiconductor, an acicular metal or a mixture thereof, comprising applying a force to the surface of the electron field emitter wherein the force results in the removal of a portion of the electron field emitter thereby forming a new surface of the electron field emitter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.