Precursors for the polymer-assisted deposition of films
US8530554B1 · kind B1 · utility
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Key dates
| Filing date | Apr 29, 2008 |
| Grant date | Sep 10, 2013 |
| Priority date | — |
| Expiry date | Jun 5, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K3/10
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A polymer assisted deposition process for deposition of metal oxide films is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.