Micro gas-puff based source
US8530854B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2012 |
| Grant date | Sep 10, 2013 |
| Priority date | — |
| Expiry date | Oct 9, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E30/10
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
Various technologies described herein pertain to a micro gas-puff based source of neutrons, x-rays, and/or energetic particles. The micro gas-puff based source can generate plasma, which can emit neutrons, x-rays, and the like. The micro gas-puff based source includes a diode, which further includes an anode and a cathode. Further, a chamber is between the anode and the cathode. Moreover, a MEMS gas supply can inject a puff of gas between the anode and the cathode within the chamber, where the MEMS gas supply shapes the puff of gas to form a quasispherical density profile of gas created in various of geometries. Further, a pulsed power supply applies a voltage across the anode and the cathode to cause compression of the puff of gas to form the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.