Photocurable composition
US8536242B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 23, 2008 |
| Grant date | Sep 17, 2013 |
| Priority date | — |
| Expiry date | May 25, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L2312/06
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention provides a photocurable composition which contains a photobase generator capable of generating a satisfactory amount of a base in a high quantum yield when irradiated even with a small quantity of light for a short time, and contains a curable compound that is rapidly cured by the generated base such that the composition is cured into a cured product. The photocurable composition comprises: a photobase generator (A) which is a salt of a carboxylic acid (a1-1) represented by the following formula (1-1) with a basic compound (a2), and a curable compound (B) which has, in one molecule thereof, at least two functional groups selected from among epoxy group, (meth)acryloyl group, isocyanato group, acid anhydride group, and alkoxysilyl group,where R1 to R7 in the above formula (1-1) each are hydrogen or an organic group, R1 to R7 may be the same or different, and two of R1 to R7 may be bonded to each other to form a ring structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.