Electronic shutter with photogenerated charge extinguishment capability for back-illuminated image sensors
US8536625B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 9, 2010 |
| Grant date | Sep 17, 2013 |
| Priority date | — |
| Expiry date | Jun 18, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/156
Abstract
An electronic image sensor includes a semiconductor substrate having a first surface configured for accepting illumination to a pixel array disposed in the substrate. An electrically-doped channel region for each pixel is disposed at a second substrate surface opposite the first substrate surface. The channel regions are for collecting photogenerated charge in the substrate. An electrically-doped channel stop region is at the second substrate surface between each channel region. An electrically-doped shutter buried layer, disposed in the substrate at a depth from the second substrate surface that is greater than that of the pixel channel regions, extends across the pixel array. An electrically-doped photogenerated-charge-extinguishment layer, at the first substrate surface, extends across the pixel array. A substrate bulk region between the shutter buried layer and the photogenerated-charge-extinguishment layer is characterized by an electrical resistivity enabling independent electrical bias of the photogenerated-charge-extinguishment layer from electrically-doped regions of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.