Array substrate and manufacturing method thereof, liquid crystal display
US8537327B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 21, 2011 |
| Grant date | Sep 17, 2013 |
| Priority date | — |
| Expiry date | Nov 10, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136236
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the disclosed technology relates to an array substrate, a manufacturing method thereof and a liquid crystal display. The method comprises: forming a gate metal film, applying photoresist on the gate metal film, patterning to form a gate line, a gate electrode and a gate line leading wire, and remain a part of photoresist on the gate line leading wire; sequentially depositing a gate insulating film, an active layer film and a source/drain metal film, applying photoresist on the source/drain metal film and patterning to form source/drain electrodes and a channel; lifting off the remained photoresist, the gate insulating film and the photoresist above the gate line leading wire; and then forming a protection layer and a pixel electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.