Apparatus for chemical bath deposition between two covers, wherein a cover is a substrate
US8539907B2 · kind B2 · utility
2Cited by
29References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2011 |
| Grant date | Sep 24, 2013 |
| Priority date | — |
| Expiry date | Dec 16, 2031 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05C3/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention provides a film deposition apparatus, which includes a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, and the first cover has at least two holes, and a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover form a film deposition space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.