Optical member for deep ultraviolet and process for producing same
US8541326B2 · kind B2 · utility
9Cited by
1References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 30, 2012 |
| Grant date | Sep 24, 2013 |
| Priority date | — |
| Expiry date | Apr 30, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention relates to an optical member for deep ultraviolet having a wavelength of 250 nm or shorter, containing a synthetic silica glass which does not substantially contain a halogen element, has a maximum OH group content of less than 10 ppm by weight, has contents of ODC (oxygen deficient centers) and E-prime center of each less than 1×1014 cm−3, does not substantially contain SiH and peroxy linkage, and has a fictive temperature of 1,050° C. or lower.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.