Norbornene-type polymers, compositions thereof and lithographic process using such compositions
US8541523B2 · kind B2 · utility
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38References
11Claims
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Key dates
| Filing date | Apr 4, 2011 |
| Grant date | Sep 24, 2013 |
| Priority date | — |
| Expiry date | Aug 3, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.