Diffraction grating, organic EL element using the same, and manufacturing methods thereof
US8541778B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 16, 2010 |
| Grant date | Sep 24, 2013 |
| Priority date | — |
| Expiry date | Jul 16, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/821
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A diffraction grating having a transparent supporting substrate; and a cured resin layer which is stacked on the transparent supporting substrate and which has concavities and convexities formed on a surface thereof, wherein when a Fourier-transformed image is obtained by performing two-dimensional fast Fourier transform processing on a concavity and convexity analysis image obtained by analyzing a shape of the concavities and convexities formed on the surface of the cured resin layer by use of an atomic force microscope, the Fourier-transformed image shows a circular or annular pattern substantially centered at an origin at which an absolute value of wavenumber is 0 μm−1, and the circular or annular pattern is present within a region where an absolute value of wavenumber is within a range of 10 μm−1 or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.