Power supply device for plasma processing
US8542471B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 8, 2010 |
| Grant date | Sep 24, 2013 |
| Priority date | — |
| Expiry date | Dec 4, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02H1/06
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A power supply device for plasma processing, wherein electric arcs may occur, comprises a power supply circuit for generating a voltage across output terminals, and a first switch connected between the power supply circuit and one of the output terminals. According to a first aspect the power supply device comprises a recovery energy circuit connected to the output terminals and to the power supply circuit. According to a second aspect the power supply device comprises an inductance circuit including an inductor and a second switch connected parallel to the inductor. According to a third aspect the power supply device comprises a controller for causing the power supply circuit and the first switch to be switched on and off. The controller is configured to determine a quenching time interval by means of a self-adaptive process. The quenching time interval defines the time interval during which, in an event of an arc, no voltage is generated across the output terminals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.