Apparatus and methods for regulating material flow using a temperature-actuated valve
US8544296B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 2, 2012 |
| Grant date | Oct 1, 2013 |
| Priority date | — |
| Expiry date | Feb 2, 2032 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF17D1/05
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
One embodiment of the present invention is a gas discharge system utilizing a temperature-actuated valve. The temperature-actuated valve uses a temperature-measuring device to sense the temperature of the natural gas after it pass through an expansion valve and after leaving a heat exchanger inside the discharge station. This temperature-measuring device sends a signal to a valve that is automatically actuated. If the temperature of the gas is too low, the valve is tightened, increasing the residence time in the heat exchanger and increasing the gas temperature. If the gas temperature is too high, the valve is opened, reducing the residence time in the heat exchanger, decreasing gas temperature. Using this temperature-actuated valve to control the temperature of a wet gas discharge station is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.