Patent · US Active

Subtalar implant

US8545572B2 · kind B2 · utility

13Cited by
3References
19Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 21, 2011
Grant dateOct 1, 2013
Priority date
Expiry dateJun 28, 2031

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB33Y80/00
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

One embodiment of the invention includes a sinus tarsi implant with an inverted thread profile having a lip or lips at the thread crest. The lips may help hold tissue in-growth and give greater purchase to the implant. The implant may also include voids that traverse threads. The voids may create an open area for soft tissue to grow into. The voids may be relatively small and consequently promote faster tissue in-growth. Thus, the lips and/or voids limit migration. They do this without creating sharp edges or pressure points (or at least limiting such creation) that are typically associated with techniques (e.g., cutting deep negative thread spaces) used to prevent migration. Therefore, the embodiments of the invention limit migration while also limiting patient discomfort. Other embodiments are disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.