Method for electrochemically depositing carbon nitride films on a substrate
US8545688B2 · kind B2 · utility
1Cited by
2References
16Claims
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Key dates
| Filing date | May 28, 2010 |
| Grant date | Oct 1, 2013 |
| Priority date | — |
| Expiry date | Aug 1, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D9/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Dense carbon nitride films are electrochemically formed on a conductive substrate by placing the substrate acting as cathode in a molten salt electrolyte bath and applying DC current across the substrate and a counter electrode acting as anode also placed in the molten salt electrolyte bath. Carbonate ion and nitrate ion are concurrently reduced to deposit carbon nitride films on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.