Micropattern generation with pulsed laser diffraction
US8545945B2 · kind B2 · utility
0Cited by
1References
14Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 27, 2012 |
| Grant date | Oct 1, 2013 |
| Priority date | — |
| Expiry date | Jan 27, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2035/0838
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Methods and devices for preparing microscale polymer relief structures from a thin polymer layer on an absorbing substrate are described. The described methods are ultrafast (about 8 nanoseconds) and allow formation of patterned microstructures having complex morphologies and narrow line widths that are an order of magnitude smaller than the masks used in the methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.