Monolithic aluminum alloy target and method of manufacturing
US8551267B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2010 |
| Grant date | Oct 8, 2013 |
| Priority date | — |
| Expiry date | Oct 22, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/3414
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Aluminum or aluminum alloy sputter targets and methods of making same are provided. The pure aluminum or aluminum alloy is mechanically worked to produce a circular blank, and then the blank is given a recrystallization anneal to achieve desirable grain size and crystallographic texture. A 10-50% additional strain is provided to the blank step after the annealing to increase the mechanical strength. Further, in a flange area of the target, the strain is greater than in the other target areas with the strain in the flange area being imparted at a rate of about 20-60% strain. The blank is then finished to form a sputtering target with desirable crystallographic texture and adequate mechanical strength.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.