Patent · US Active

Methods of producing hydrochloric acid from hydrogen gas and chlorine gas

US8551299B2 · kind B2 · utility

18Cited by

68References

14Claims

0Family size

Assignee

Deeya Energy, Inc. · US

Inventors

Majid Keshavarz · Pleasanton, US
Saroj Kumar Sahu · Tracy, US
Chockkalingam Karuppaiah · Troy, US
Ge Zu · San Jose, US
Suresh Kumar Surapalan Nair · Fremont, US
Vasanthan Mani · Fremont, US

Key dates

Filing date	May 28, 2010
Grant date	Oct 8, 2013
Priority date	—
Expiry date	May 4, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E60/50
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A method of producing HCl from H2 and Cl2 is provided. In some embodiments, the method comprises at least one photochemical chamber placed in fluid communication with at least one source of H2 and at least one source of Cl2. In some embodiments, the photochemical chamber effects the formation of HCl through the use of at least one source of ultraviolet radiation contained therein. In some embodiments, the HCl product may be captured and used as a gas. In some embodiments, the HCl product may be absorbed into water to form an aqueous HCl solution.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.