Patent · US Active

Rare-earth doped alkaline-earth silicon nitride phosphor, method for producing and radiation converting device comprising such a phosphor

US8551360B2 · kind B2 · utility

6Cited by
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14Claims
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Key dates

Filing dateOct 14, 2008
Grant dateOct 8, 2013
Priority date
Expiry dateMay 1, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09K11/77348
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

The invention relates to a method of manufacturing a rare-earth doped alkaline-earth silicon nitride phosphor of a stoichiometric composition. Said method comprising the step of selecting one or more compounds each comprising at least one element of the group comprising the rare-earth elements (RE), the alkaline-earth elements (AE), silicon (Si) and nitrogen (N) and together comprising the necessary elements to form the rare-earth doped alkaline-earth silicon nitride phosphor (AE2Si5N8:RE). The method further comprises the step of bringing the compounds at an elevated temperature in reaction for forming the rare-earth doped alkaline-earth silicon nitride phosphor (AE2Si5N8:RE). In such a method normally a small amount of oxygen, whether intentionally or not-intentionally added, will be incorporated in the rare-earth doped alkaline-earth silicon nitride phosphor (AE2Si5N8:RE). According to the invention the creation of defects by formation of a non-stoichiometric oxygen containing phosphor is at least partly prevented by partly substituting for the ions (AE, Si, N) of the alkaline-earth silicon nitride phosphor (AE2Si5N8:RE) suitable further elements of the periodic system by which …

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.